Del 85 - European Materials Research Society Symposia Proceedings
Inbunden, Engelska, 1999
2 729 kr
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These proceedings contain the reviewed papers presented at the Symposium J on "Ion Implantation into Semiconductors, Oxides and Ceramics", which was held at the Spring Meeting of the European Materials Research Society in Strasbourg, France, 16-19, June 1998. The symposium attracted 110 contributions, with authors from 31 nations in 5 continents. It was thereby the largest in a series of E-MRS ion beam symposia, documenting the importance of ion beam techniques and research in this area.
The aim of this symposium was to provide a forum for the discussion of new results in the implantation of materials from three different classes: semiconductors, oxides and ceramics.
P. Delhaes, H. Kuzmany, France,) Delhaes, P. (Centre de Recherche, Paul-Pascal CNRS, Avenue Schweitzer, F-33600 Pessac, Austria.) Kuzmany, H. (Universitat Wien, Institut fur Materialphysik, Strudlhofgasse 4, A-1090 Wien
3 999 kr
J.-M. Lourtioz, G. Abstreiter, B. Meyerson, France) Lourtioz, J.-M. (Institut d'Electronique Fondamentale, Universite de Paris-Sud, Orsay Cedex, France) Abstreiter, G. (Institut de Electronique Fondamentale, Universite Paris-Sud, Orsay, USA) Meyerson, B. (IBM TJ Watson Research Center, Yorktown Heights, NY, J. -M Lourtioz
3 409 kr
B. Equer, B. Drevillon, I. French, T. Kallfass, France) Drevillon, B. (Ecole Polytechnique, Laboratoire PICM, Palaiseau, UK) French, I. (Philips Research Laboratory, Redhill, Germany) Kallfass, T. (Institut fur Netzwerk und Systemtheorie, University of Stuttgart
2 339 kr
J.M. Martinez-Duart, R. Madar, R.A. Levy, Spain) Martinez-Duart, J.M. (Fisica Aplicada, Universidad Cantoblanco, Madrid, France) Madar, R. (LMPG-ENSPG, Saint Martin d'Heres, USA) Levy, R.A. (New Jersey Institute of Technology, Newark, NJ, J. M. Martinez-Duart
1 949 kr
J. Robertson, J. Fink, E. Kohn, UK) Robertson, J. (University of Cambridge, Germany) Fink, J. (IFW Dresden, Germany) Kohn, E. (Universitat Ulm
1 949 kr
F. Garnier, J. Zyss, France) Garnier, F. (CNRS, Laboratoire des Materiaux Moleculaires, Thiais, France) Zyss, J. (France Telecom/CNET, Bagneux and ENS Cachan, LPQM, Cachan
2 339 kr
A. Hangleiter, J.-Y. Duboz, K. Kishino, F.A. Ponce, Germany) Hangleiter, A. (Optoelectronics Group, University of Stuttgart, France) Duboz, J.-Y. (Central Research Laboratory, Thomson-CSF, Orsay, Japan) Kishino, K. (Electrical and Electronics Engineering, Sophia University, Tokyo, USA) Ponce, F.A. (Xerox Parc, Palo Alto. CA
2 629 kr
Th. Gessner, Germany) Gessner, Th. (Zentrum fur Mikrotechnologien, TU Chemnitz, Th Gessner
4 089 kr
B.K. Meyer, Germany;) Meyer, B.K. (I. Phusikalisches Institut, Justus Liebig University of Giessen, Heinrich Buff Ring 16, D-35392 Giessen, B. K. Meyer
2 929 kr
F. Petroff, M.A.M. Gijs, France) Petroff, F. (UM Thomson-CNRS, Orsay Cedex, The Netherlands) Gijs, M.A.M. (Philips Research Laboratories, Eindhoven, M. a. M. Gijs
4 869 kr
