Optical Imaging and Sensing

Materials, Devices, and Applications

Inbunden, Engelska, 2023

Av Jiang Wu, Hao Xu, Jiang (University of Electronic Science and Technology of China) Wu, Hao (University of Electronic Science and Technology of China) Xu

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Optical Imaging and Sensing Understand the future of optical imaging with this cutting-edge guide Optoelectronic devices for imaging and sensing are among the backbones of modern technology. Facilitating the mutual conversion of optical and electrical signals, they have applications from telecommunications to molecular spectroscopy, and their incorporation into photon-involved technologies is only growing. The rapid development of this field makes the need for a fully up-to-date introduction all the more critical. Optical Imaging and Sensing meets this need with a comprehensive guide to the novel materials and devices employed in optical imaging and sensing. Given the current revolution in new imaging materials, an introduction that fully incorporates the latest research is an indispensable tool for scientists and engineers in a huge range of fields. The technologies surveyed here promise to transform public security, 5G and next-generation wireless communication, clinical imaging, and many more. Optical Imaging and Sensing Readers will also find: Detailed discussion of materials including semimetallic graphene, semiconducting black phosphorous, and many moreDiscussion of devices from infrared photodetectors to nonlinear interferometersA thorough look forward to the future of the fieldOptical Imaging and Sensing is a useful reference for materials scientists, spectroscopists, semiconductor physicists, and engineers working in any field or industry involving optical imaging or sensing technology.

Produktinformation

Utgivningsdatum2023-09-06
Mått170 x 244 x 22 mm
Vikt624 g
FormatInbunden
SpråkEngelska
Antal sidor288
FörlagWiley-VCH Verlag GmbH
ISBN9783527349760

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Jiang Wu, PhD, is a Full Professor at the University of Electronic Science and Technology of China (UESTC). He has previous research experience at University College London, UK, and is a Fellow of the Higher Education Academy, an IEEE Senior Member, and a Director of the Chinese Society for Optical Engineering. His research focuses on compound semicondutors and optoelectronic devices for sensing. He has published over 200 technical papers on optoelectronic devices, sensors, and related fields. Hao Xu, PhD, is a Research Fellow at the University of Electronic Science and Technology of China (UESTC) and a visiting researcher at Nanyang Technological University (NTU), China. He obtained his PhD in Photonics and Nanotechnology from University College London, UK, and his research focuses on nanoelectronics and optoelectronics.

Preface ix1 Introduction of Optical Imaging and Sensing: Materials, Devices, and Applications 1Qimiao Chen, Hao Xu, and Chuan S. Tan1.1 Optoelectronic Material Systems 11.1.1 Si Platform 11.1.2 Two-dimensional Materials and Their van der Waals Heterostructures 31.1.2.1 Graphene 31.1.2.2 Transition Metal Dichalcogenides 41.1.2.3 2D Heterostructures 51.2 Challenges and Prospect of Nano-optoelectronic Devices 51.2.1 III–V Compounds 61.2.2 Perovskites 71.2.3 Organic Optoelectronic Materials 7References 82 2D Material-Based Photodetectors for Imaging 11Wenshuo Xu, Zhuo Wang, and Andrew T. S. Wee2.1 Introduction 112.2 Visible-Light Photodetectors 152.3 Infrared Photodetectors 212.4 Broadband Photodetectors 262.5 Plasmon-Enhanced Photodetectors 362.6 Large-Scale and Flexible Photodetectors 442.7 Summary 49References 503 Surface Plasmonic Resonance-Enhanced Infrared Photodetectors 55Boyang Xiang, Guiru Gu, and Xuejun Lu3.1 Introduction 553.2 Brief Review of Basic Concepts of SPR and SPR Structures 563.2.1 Plasma Oscillations in Metals 563.2.2 Complex Permittivity and the Drude Model 563.2.3 Surface Plasmonic Waves at the Semi-infinite Dielectric and Metal Interface 573.2.4 Prism-Coupled Surface Plasmonic Wave Excitation 593.2.5 Surface Grating-Coupled Surface Plasmonic Wave Excitation 603.3 Surface Plasmonic Wave-Enhanced QDIPs 613.3.1 Two-Dimensional Metallic Hole Array (2DSHA)-Induced Surface Plasmonic Waves 613.3.2 2DSHA Surface Plasmonic Structure-Enhanced QDIP 643.4 Localized Surface Plasmonic Wave-Enhanced QDIPs 683.4.1 Localized Surface Plasmonic Waves 683.4.2 Near-Field Distributions 683.4.3 Nanowire Pair 693.4.4 Circular Disk Array for Broadband IR Photodetector Enhancement 713.5 Plasmonic Perfect Absorber (PPA) 723.5.1 Introduction to Plasmonic Perfect Absorber 723.5.2 Plasmonic Perfect Absorber-Enhanced QDIP 743.5.3 Broadband Plasmonic Perfect Absorber 763.5.4 2DSHA Plasmonic Perfect Absorber 763.6 Chapter Summary 76References 784 Optical Resistance Switch for Optical Sensing 83Shiva Khani, Ali Farmani, and Pejman Rezaei4.1 Introduction 834.2 Graphene Optical Switch 854.2.1 dc Mode of the Gate Capacitor 874.2.2 AC Mode of the Gate Capacitor 894.3 Nanomaterial Heterostructures-Based Switch 934.3.1 Situation 1: n 2 L ≫ n 2 H 954.3.2 Situation 2: n 2 H ≫ n 2 l 964.3.3 Situation 3: n 2 H ≃ n 2 l 964.4 Modulation Characteristics 1044.5 Summary 115References 1155 Optical Interferometric Sensing 123Hailong Wang and Jietai Jing5.1 Introduction 1235.2 Nonlinear Interferometer 1245.2.1 Experimental Implementation of Phase Locking 1255.2.2 Quantum Enhancement of Phase Sensitivity 1315.2.3 Enhancement of Entanglement and Quantum Noise Cancellation 1365.3 Other Types of Nonlinear Interferometers 1435.3.1 Nonlinear Sagnac Interferometer 1435.3.2 Hybrid Interferometer with a Nonlinear FWM Process and a Linear Beam-splitter 1515.3.3 Experimental Implementation of a Phase-Sensitive Parametric Amplifier 1555.3.4 Interference-Induced Quantum-Squeezing Enhancement 1605.4 Nonlinear Interferometric SPR Sensing 1645.5 Summary and Outlook 173References 1736 Spatial-frequency-shift Super-resolution Imaging Based on Micro/nanomaterials 175Mingwei Tang and Qing Yang6.1 Introduction 1756.2 The Principle of SFS Super-resolution Imaging Based on Micro/nanomaterials 1776.3 Super-resolution Imaging Based on Nanowires and Polymers 1786.4 Super-resolution Imaging Based on Photonic Waveguides 1846.4.1 Label-free Super-resolution Imaging Based on Photonic Waveguides 1846.4.2 Labeled Super-resolution Imaging Based on Photonic Waveguides 1866.5 Super-resolution Imaging Based on Wafers 1896.5.1 Principle of Super-resolution Imaging Based on Wafers 1896.5.2 Label-free Super-resolution Imaging Based on Wafers 1946.5.3 Labeled Super-resolution Imaging Based on Wafers 1956.6 Super-resolution Imaging Based on SPPs and Metamaterials 1976.6.1 SPP-assisted Illumination Nanoscopy 1996.6.1.1 Metal–Dielectric Multilayer Metasubstrate PSIM 2006.6.1.2 Graphene-assisted PSIM 2026.6.2 Localized Plasmon-assisted Illumination Nanoscopy 2036.6.3 Metamaterial-assisted Illumination Nanoscopy 2046.7 Summary and Outlook 206References 2087 Monolithically Integrated Multi-section Semiconductor Lasers: Toward the Future of Integrated Microwave Photonics 215Jin Li and Tao Pu7.1 Introduction 2157.2 Monolithically Integrated Multi-section Semiconductor Laser (MI-MSSL) Device 2197.2.1 Monolithically Integrated Optical Feedback Lasers (MI-OFLs) 2197.2.1.1 Passive Feedback Lasers (PFLs) 2207.2.1.2 Amplified/Active Feedback Lasers (AFLs) 2247.2.2 Monolithically Integrated Mutually Injected Semiconductor Lasers (MI-MISLs) 2257.3 Electro-optic Conversion Characteristics 2297.3.1 Modulation Response Enhancement 2297.3.2 Nonlinearity Reduction 2377.3.3 Chirp Suppression 2387.4 Photonic Microwave Generation 2387.4.1 Tunable Single-Tone Microwave Signal Generation 2407.4.1.1 Free-Running State 2407.4.1.2 Mode-Beating Self-Pulsations (MB-SPs) 2427.4.1.3 Period-One (P1) Oscillation 2447.4.1.4 Sideband Injection Locking 2457.4.2 Frequency-Modulated Microwave Signal Generation 2487.4.3 High-Performance Microwave Signal Generation Optimizing Technique 2507.5 Microwave Photonic Filter (MPF) 2547.6 Laser Arrays 2567.7 Conclusion 259Funding Information 261Disclosures 261References 261Index 271