Growth and Application of AlN Single Crystal

Ke Xu has been engaged in the growth and equipment research of Nitride semiconductor materials for a long time. He has systematically studied the growth of Gallium Nitride materials. He has successfully developed high quality complete 2-inch single crystal gallium nitride substrate and achieved industrial preparation，and the key technology of 6-inch GaN single crystal has been broken through in recent years. Aiming at the cutting-edge research of nanomaterials and devices, the comprehensive photoelectric testing technology and equipment for spatial resolution of nanometer scale are developed. The spatial resolution can reach 30nm, and the photogenerated carrier distribution near a single dislocation can be measured. Published more than 130 papers, applied for more than 100 patents, and made more than 20 invited presentations at international conferences. He is a co-chair of the International Conference of Nitride Semiconductor (ICNS) to be held in Fukuda, Japan in 2023, which is themost important international conference on third-generation semiconductorsJun Huang worked as a research fellow at JiuFengShan Laboratory in Hubei, China, where he is currently a materials center specialist. His research interests include wide band semiconductor materials such as AlN, GaN, Ga2O3 and diamond. He has published or co-authored more than 50 papers in journals and one monograph in Chinese.

• Basic Properties of Ain Single Crystal.- Physical Basis for the Growth of Ain Single Crystal.- Defects in Ain Single Crystal.- Growth of Ain Bulk Crystal by Physical Vapor Transport.- Growth of Thick Ain Layers by Hydride Vapor Phase Epitaxy.- Growth of Thin Ain Layers by Metal Organic Chemical Vapor Deposition.- Aluminium Nitride based Semiconductor Devices.