EUV Lithography

Inbunden, Engelska, 2009

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EUVL is an area of intense research and this book provides the foundation required for understanding and applying this technology. It offers contributions from the world's leading EUVL researchers, and provides all the critical information needed by practitioners and those wanting to enter the field.

Produktinformation

Utgivningsdatum2009-01-16
Mått178 x 254 x 43 mm
Vikt1 542 g
FormatInbunden
SpråkEngelska
Antal sidor702
FörlagJohn Wiley & Sons Inc
ISBN9780470471555

Tillhör följande kategorier

1. EUV Lithography: A Historical Perspective / Hiroo Kinoshita and Obert Wood 2. EUV LLC: An Historical Perspective / Chuck Gwyn and Stefan Wurm3. EUV Source Technology / Vivek Bakshi4A. Optics and Multilayer Coatings for EUVL Systems / Regina Soufli, Saša Bajt, Russell M. Hudyma and John S. Taylor4B. Projection Systems for Extreme Ultraviolet Lithography / Russell M. Hudyma and Regina Soufli4C. Specification, Fabrication, Testing, and Mounting of EUVL Optical Substrates / John S. Taylor and Regina Soufli4D. Multilayer Coatings for EUVL / Regina Soufli and Saša Bajt5. EUV Optical Testing / Kenneth A. Goldberg6A. Optics Contamination / Saša Bajt6B. Grazing Angle Collector Contamination / Valentino Rigato6C. Normal Incidence (Multilayer) Collector Contamination / David N. Ruzic and Shailendra N. Srivastava7. EUV Mask and Mask Metrology / Han-Ku Cho and Jinho Ahn8. Photoresists for Extreme Ultraviolet Lithography / Robert L. Brainard9. High-Resolution EUV Imaging Tools for Resist Exposure and Aerial Image Monitoring / Malcolm Gower10. Fundamentals of the EUVL Scanner / Kazuya Ota11. EUVL System Patterning Performance / Patrick Naulleau, John E. Bjorkholm, and Manish Chandhok12. Lithography Cost of Ownership / Phil SeidelAppendix: Example Case Studies of Lithography CoO Calculations