This is the proceedings of a workshop which brought together researchers from universities and research institutes who work in the fields of (semiconductor) surface science, epitaxial growth, materials deposition and optical diagnostics relevant to (semiconductor) materials and structures of interest for present and anticipated (spin) electronic devices. The workshop assessed the capabilities of state-of-the-art optical techniques in elucidating the fundamental electronic and structural properties of semiconductor and metal surfaces, interfaces, thin layers, and layer structures, and examined the usefulness of these techniques for optimization of high quality multilayer samples through feedback control during materials growth and processing.

This is the proceedings of a workshop which brought together researchers from universities and research institutes who work in the fields of (semiconductor) surface science, epitaxial growth, materials deposition and optical diagnostics relevant to (semiconductor) materials and structures of interest for present and anticipated (spin) electronic devices. The workshop assessed the capabilities of state-of-the-art optical techniques in elucidating the fundamental electronic and structural properties of semiconductor and metal surfaces, interfaces, thin layers, and layer structures, and examined the usefulness of these techniques for optimization of high quality multilayer samples through feedback control during materials growth and processing.

This is the proceedings of a workshop which brought together researchers from universities and research institutes who work in the fields of (semiconductor) surface science, epitaxial growth, materials deposition and optical diagnostics relevant to (semiconductor) materials and structures of interest for present and anticipated (spin) electronic devices. The workshop assessed the capabilities of state-of-the-art optical techniques in elucidating the fundamental electronic and structural properties of semiconductor and metal surfaces, interfaces, thin layers, and layer structures, and examined the usefulness of these techniques for optimization of high quality multilayer samples through feedback control during materials growth and processing.