Databook of Nucleating Agents

Databook of Nucleating Agents, Third Edition gives engineers and materials scientists the information they need to increase the production rate, modify structure and morphology, and reduce the haze of polymeric products through proper selection of nucleating and clarifying agents. Chemical origin and related properties of nucleating agents are analyzed in general terms to highlight the differences in their properties, including the essential theoretical knowledge required for correct selection and use of nucleating and clarifying agents. This includes methods of chemical modification of nucleating agents and their deposition on suitable substrates, methods and results of dispersion of nucleating agents, influence of their concentration and cooling rate on final result and rate of crystallization, nucleation efficiency of different products and the reasons behind it, and generally accepted mechanisms of nucleation. The book also covers application aspects in different formulations. Patent literature and research papers are extensively reviewed for different applications, and polymer processing methods which require the use of nucleating agents are discussed, with an emphasis on the intricacies of using nucleating agents in different polymers and products. Production of many nucleating agents included in the previous editions has been discontinued, and those agents have been replaced by recently developed ones. Existing additives have been modified and repurposed, and this new edition also contains revised data on currently available generic and commercial nucleating agents.

• Provides key information for increasing production rates, modifying structures and morphologies, and reducing haze in polymeric products
• Analyzes chemical origin and related properties of widely-used nucleating agents
• Includes the essential theoretical knowledge required for correct selection and use of nucleating and clarifying agents
• Outlines methods of chemical modification of nucleating agents and their deposition on suitable substrates