Atomic Layer Deposition for Semiconductors

Häftad, Engelska, 2016

2 389 kr

Beställningsvara. Skickas inom 10-15 vardagar. Fri frakt för medlemmar vid köp för minst 249 kr.

This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes.

Produktinformation

Utgivningsdatum2016-08-23
Mått155 x 235 x 18 mm
Vikt482 g
FormatHäftad
SpråkEngelska
Antal sidor263
FörlagSpringer-Verlag New York Inc.
ISBN9781489979438

Tillhör följande kategorier

Energiteknik inom Naturvetenskap och teknik
Hårdvara inom Data och IT
Elektronik och kommunikationer inom Naturvetenskap och teknik
Fysikalisk kemi inom Naturvetenskap och teknik

Cheol Seong Hwang received M.S. and Ph.D. degrees from Seoul National University, Seoul, Korea, in 1989 and 1993, respectively. In 1993, he joined the Material Science and Engineering Laboratory at the National Institutes of Standards and Technology, Gaithersburg, MD, as a Postdoctoral Research Fellow. He then joined Samsung Electronics Company, Ltd., as a Senior Researcher in 1994. In 1998, Dr. Hwang became a professor in the department of material science and engineering at Seoul National University. He has authored or coauthored more than 380 papers in international peer-reviewed scientific journals, which have been cited more than 7,500 times.Dr. Hwang was a recipient of the Alexander von Humboldt Fellowship Award, the 7th Presidential Young Scientist Award of the Korean government, and Faculty Excellent Award of Air Products, USA.