Spacer Engineered FinFET Architectures
High-Performance Digital Circuit Applications
Inbunden, Engelska, 2017
Av Sudeb Dasgupta, Brajesh Kumar Kaushik, Pankaj Kumar Pal, India) Dasgupta, Sudeb (Indian Institute of Technology, Roorkee, India) Kaushik, Brajesh Kumar (Indian Institute of Technology-Roorkee, India) Pal, Pankaj Kumar (Indian Institute of Technology-Roorkee
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This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
Produktinformation
- Utgivningsdatum2017-06-06
- Mått156 x 234 x 16 mm
- Vikt378 g
- FormatInbunden
- SpråkEngelska
- Antal sidor154
- FörlagTaylor & Francis Inc
- ISBN9781498783590
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