Spacer Engineered FinFET Architectures
High-Performance Digital Circuit Applications
Inbunden, Engelska, 2017
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This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
Produktinformation
- Utgivningsdatum2017-06-06
- Mått156 x 234 x 16 mm
- Vikt430 g
- SpråkEngelska
- Antal sidor154
- FörlagTaylor & Francis Inc
- EAN9781498783590