Spacer Engineered FinFET Architectures
High-Performance Digital Circuit Applications
Häftad, Engelska, 2020
899 kr
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This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
Produktinformation
- Utgivningsdatum2020-06-30
- Mått156 x 234 x undefined mm
- Vikt453 g
- SpråkEngelska
- Antal sidor138
- FörlagTaylor & Francis Ltd
- EAN9780367573553