Spacer Engineered FinFET Architectures

High-Performance Digital Circuit Applications

Häftad, Engelska, 2020

AvSudeb Dasgupta,Brajesh Kumar Kaushik,Pankaj Kumar Pal,India) Dasgupta, Sudeb (Indian Institute of Technology, Roorkee,India) Kaushik, Brajesh Kumar (Indian Institute of Technology-Roorkee,India) Pal, Pankaj Kumar (Indian Institute of Technology-Roorkee

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This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.

Produktinformation

Utgivningsdatum2020-06-30
Mått156 x 234 x undefined mm
Vikt453 g
FormatHäftad
SpråkEngelska
Antal sidor138
FörlagTaylor & Francis Ltd
ISBN9780367573553

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PrefaceAbout the AuthorsChapter 1 ◾ Introduction to NanoelectronicsChapter 2 ◾ Tri-Gate FinFET Technology and Its AdvancementChapter 3 ◾ Dual-k Spacer Device Architecture and Its ElectrostaticsChapter 4 ◾ Capacitive Analysis and Dual-k FinFET-Based Digital Circuit DesignChapter 5 ◾ Design Metric Improvement of a Dual-k–Based SRAM CellChapter 6 ◾ Statistical Variability and Sensitivity AnalysisINDEX

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