bokomslag Sub-Half-Micron Lithography for ULSIs

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344 sidor
2005

This book describes advanced techniques under development in Japan and elsewhere that represent the key to future semiconductor-device fabrication. Several important lithography methods, such as deep UV, X-ray, electron-beam, and focused ion-beam lithography are described in detail by experts. The principles underlying each of the techniques are illustrated at the beginning of each chapter.

Författare: Katsumi Suzuki, Shinji Matsui, Yukinori Ochiai, Katsumi Suzuki, Shinji Matsui
Format: Pocket/Paperback
ISBN: 9780521022347
Språk: Engelska
Antal sidor: 344
Utgivningsdatum: 2005-11-10
Förlag: Cambridge University Press