• 1. Introduction; 2. Anisotropic wet chemical etching; 3. Chemical physics of wet chemical etching; 4. Waferbonding; 5. Examples and applications; 6. Surface micromachining; 7. Isotropic wet chemical etching of silicon; 8. Introduction into dry etching; 9. Why plasmas?; 10. Plasma system configurations; 11. What is plasma etching?; 12. Contact plasma etching; 13. Remote plasma etching; 14. High aspect ratio trench etching; 15. Moulding of microstructures; 16. Fabrication of movable microstructures.

'This book has many admirable properties. It covers the chosen subject in considerable detail and brings together much of the state-of-the-art. The illustrations and photographs are of very high quality and indeed the whole book is well presented. It will be useful to both the experienced engineer wishing to sort out a few problems in his own work and to those requiring an introduction to silicon microengineering' R. A. Lawes, Engineering Science and Education Journal

• 1. Introduction; 2. Anisotropic wet chemical etching; 3. Chemical physics of wet chemical etching; 4. Waferbonding; 5. Examples and applications; 6. Surface micromachining; 7. Isotropic wet chemical etching of silicon; 8. Introduction into dry etching; 9. Why plasmas?; 10. Plasma system configurations; 11. What is plasma etching?; 12. Contact plasma etching; 13. Remote plasma etching; 14. High aspect ratio trench etching; 15. Moulding of microstructures; 16. Fabrication of movable microstructures.

'This book has many admirable properties. It covers the chosen subject in considerable detail and brings together much of the state-of-the-art. The illustrations and photographs are of very high quality and indeed the whole book is well presented. It will be useful to both the experienced engineer wishing to sort out a few problems in his own work and to those requiring an introduction to silicon microengineering' R. A. Lawes, Engineering Science and Education Journal

• 1. Introduction; 2. Anisotropic wet chemical etching; 3. Chemical physics of wet chemical etching; 4. Waferbonding; 5. Examples and applications; 6. Surface micromachining; 7. Isotropic wet chemical etching of silicon; 8. Introduction into dry etching; 9. Why plasmas?; 10. Plasma system configurations; 11. What is plasma etching?; 12. Contact plasma etching; 13. Remote plasma etching; 14. High aspect ratio trench etching; 15. Moulding of microstructures; 16. Fabrication of movable microstructures.

'This book has many admirable properties. It covers the chosen subject in considerable detail and brings together much of the state-of-the-art. The illustrations and photographs are of very high quality and indeed the whole book is well presented. It will be useful to both the experienced engineer wishing to sort out a few problems in his own work and to those requiring an introduction to silicon microengineering' R. A. Lawes, Engineering Science and Education Journal