Plasma Processes for Semiconductor Fabrication
Häftad, Engelska, 2005
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Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.
Produktinformation
- Utgivningsdatum2005-09-29
- Mått178 x 254 x 14 mm
- Vikt414 g
- FormatHäftad
- SpråkEngelska
- SerieCambridge Studies in Semiconductor Physics and Microelectronic Engineering
- Antal sidor232
- FörlagCambridge University Press
- ISBN9780521018005