Plasma Processes for Semiconductor Fabrication
Inbunden, Engelska, 1999
Av W. N. G. Hitchon, W. Nicholas G. Hitchon, Haroon Ahmad, Michael Pepper
2 619 kr
Beställningsvara. Skickas inom 5-8 vardagar
Fri frakt för medlemmar vid köp för minst 249 kr.Finns i fler format (1)
Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.
Produktinformation
- Utgivningsdatum1999-01-28
- Mått180 x 259 x 18 mm
- Vikt650 g
- FormatInbunden
- SpråkEngelska
- SerieCambridge Studies in Semiconductor Physics and Microelectronic Engineering
- Antal sidor232
- FörlagCambridge University Press
- ISBN9780521591751