Plasma Processes for Semiconductor Fabrication
Inbunden, Engelska, 1999
Av W. N. G. Hitchon, W. Nicholas G. Hitchon, Haroon Ahmad, Michael Pepper
2 639 kr
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Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.
Produktinformation
- Utgivningsdatum1999-01-28
- Mått180 x 259 x 18 mm
- Vikt650 g
- SpråkEngelska
- SerieCambridge Studies in Semiconductor Physics and Microelectronic Engineering
- Antal sidor232
- FörlagCambridge University Press
- EAN9780521591751