Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, and so on. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. "Nanolithography" contains updated reviews by experts on the well-established techniques - electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) - as well as on emergent techniques, such as scanning tunnelling lithography (STL).
