Modern Ion Plating Technology

Fundamentals and Applications

Häftad, Engelska, 2022

AvFuzhen Wang,Junwei Wu,China) Wang, Fuzhen (Professor, College of Mechanical Engineering, Beijing Union University,China) Wu, Junwei (Associate Professor, Harbin Institute of Technology, Shenzhen, Guangdong

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Modern Ion Plating Technology: Fundamentals and Applications discusses the fundamental concepts of plasma physics in various coating technologies and explores its development and implementation into new technologies. Recent progress of technologies and products via ion plating will be introduced. The book begins with the treatment of vacuum physics, through plasma physics. It then presents the various forms of ion plating, before concluding with a section presenting examples of applications where ion plating is employed. Through the material presented in this book, the reader gains an understanding of the importance of ion plating technology to human progress and its various potential applications. Under the guidance of plasma physics knowledge, how to use electric and electromagnetic fields to control the space plasma will be critical to the development of new technology and systems.

Presents both the principle and processes of various ion plating technology
Introduces the fundamental physics of ion plating
Includes the application of ion plating technology in high-tech products

Produktinformation

Utgivningsdatum2022-09-29
Mått191 x 235 x undefined mm
Vikt1 110 g
FormatHäftad
SpråkEngelska
Antal sidor550
FörlagElsevier Science
ISBN9780323908337

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Maskinteknik och material inom Naturvetenskap och teknik

Prof. Fuzhen Wang graduated from Beijing Institute of Iron and Steel in 1960, majoring in metallographic heat treatment. She began her career with the Beijing University of Technology. In 1984, she transferred to the College of Mechanical Engineering, Beijing Union University, and was promoted to Professor in 1988. In 1991, she was recognized as an outstanding expert in Beijing and enjoyed the subsidies of the State Council. Professor Wang began to study "ion plating technology" in 1976. In 1978, the first ARE (activated reactive evaporation) equipment was successfully developed in China. Professor Wang has authored two books: Surface Deposition Technology, published in 1989 and Applied Technology of Gas Deposition, 2007. In addition, in 2014 she developed a video tutorial entitled, Ion Coating Technology. Prof. Junwei Wu is an associate professor in Harbin Institute of Technology (Shenzhen) and also serves as a deputy secretary general of Shenzhen Association of Vacuum Technology Industries (SAVTI), and is a member of the international advisory board of Society of Vacuum Coaters (SVC). He obtained his Ph.D. from West Virginia University in 2009 and has published more than 50 journal papers on both ion plating technology and mass production.

1. Introduction of Ion Plating Technology2. Fundamental of Vacuum Physics3. Fundamental of Plasma Physics4. Classification of Vacuum Plating Technology5. Vacuum Evaporation Plating6. Glow discharge Ion plating7. 7 Hot Arc Ion Plating8. Cathodic Arc Ion Plating9. Magnetron Sputtering Technology10. Plasma chemical vapor deposition (CVD)11. Function of Charged Particle Beams in Plating12. Application of Ion Plating