Vetenskap & teknik
Pocket
High Power Impulse Magnetron Sputtering
Daniel Lundin • Tiberiu Minea • Jon Tomas Gudmundsson
2709:-
Uppskattad leveranstid 10-16 arbetsdagar
Fri frakt för medlemmar vid köp för minst 249:-
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
- Format: Pocket/Paperback
- ISBN: 9780128124543
- Språk: Engelska
- Antal sidor: 398
- Utgivningsdatum: 2019-08-30
- Förlag: Elsevier Science Publishing Co Inc