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Hf-Based High-k Dielectrics

Process Development, Performance Characterization, and Reliability

Häftad, Engelska, 2007

AvYoung-Hee Kim,Jack C. Lee

399 kr

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Hard breakdown and soft breakdown, particularly the Weibull slopes, were studied under constant voltage stress. The origin of soft breakdown (first breakdown) was studied and the results suggested that the soft breakdown may be due to one layer breakdown in the bilayer structure (HfO2/SiO2: 4 nm/4 nm).

Produktinformation

  • Utgivningsdatum2007-12-31
  • Mått191 x 235 x undefined mm
  • FormatHäftad
  • SpråkEngelska
  • SerieSynthesis Lectures on Solid State Materials and Devices
  • Antal sidor92
  • FörlagSpringer International Publishing AG
  • ISBN9783031014246
  • OriginaltitelHf-Based High-k Dielectrics