Chemical Vapor Deposition for Microelectronics
Principles, Technology and Applications
Inbunden, Engelska, 1988
959 kr
Slutsåld
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Produktinformation
- Utgivningsdatum1988-12-31
- Mått152 x 229 x undefined mm
- SpråkEngelska
- Antal sidor226
- FörlagElsevier Science
- EAN9780815511366