Chemical-Mechanical Polishing 2000 - Fundamentals and Materials Issues: Volume 613 1
bokomslag Chemical-Mechanical Polishing 2000 - Fundamentals and Materials Issues: Volume 613
Vetenskap & teknik

Chemical-Mechanical Polishing 2000 - Fundamentals and Materials Issues: Volume 613

Rajiv K Singh • Rajeev Bajaj • Mansour Moinpour • Marc Meuris • Rajiv K Singh

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  • 176 sidor
  • 2014
Chemical-mechanical polishing (CMP) is a critical technology in the planarization of multilevel metallization systems and shallow-trench isolation in semiconductor manufacturing. This book, first published in 2001, provides an insight into the fundamental processes in CMP. Presentations from academia, government institutions and industry are featured.
  • Författare: Rajiv K Singh, Rajeev Bajaj, Mansour Moinpour, Marc Meuris, Rajiv K Singh
  • Format: Pocket/Paperback
  • ISBN: 9781107413146
  • Språk: Engelska
  • Antal sidor: 176
  • Utgivningsdatum: 2014-06-05
  • Förlag: Cambridge University Press

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