Advanced Nano Deposition Methods
Inbunden, Engelska, 2016
Av Yuan Lin
1 729 kr
Produktinformation
- Utgivningsdatum2016-11-02
- Mått173 x 249 x 20 mm
- Vikt839 g
- FormatInbunden
- SpråkEngelska
- Antal sidor328
- FörlagWiley-VCH Verlag GmbH
- ISBN9783527340255
Tillhör följande kategorier
Yuan Lin obtained her PhD in condensed materials from the University of Science and Technology in Hefei, China, in 1999. She continued as a research associate in the Institute of Physics at the Chinese Academic Science in Bejing, China, followed by the University of Houston and Los Alamos National Laboratory, USA, as well as a senior engineer at Intel Corp., USA.Currently, she is a Yangtze River Scholar Chair Professor at the University of Electronic Science and Technology in Chengdu, China. She has worked in the field of thin film and nanomaterials for about 20 years. Her area of expertise includes advanced material research using pulsed laser deposition, rf-sputtering and chemical-solution deposition.Dr. Lin has authored more than 90 scientific publications and 13 patents.
- List of Contributors XIII1 Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure 1Chunrui Ma and Chonglin Chen1.1 Introduction 11.2 Pulsed Laser Deposition System Setup 21.3 Advantages and Disadvantages of Pulsed Laser Deposition 31.4 TheThermodynamics and Kinetics of Pulsed Laser Deposition 31.5 Monitoring of Growth Kinetics 81.6 Fundamental Parameters inThin Film Growth 101.7 Pulsed Laser Deposition for Complex Oxide Thin Film Growth 131.8 Pulsed Laser Deposition for Nanostructure Growth 231.9 Variation of Pulsed Laser Deposition 241.10 Conclusion 24References 252 Electron Beam Evaporation Deposition 33Zhongping Wang and Zengming Zhang2.1 Introduction 332.2 Electron Beam Evaporation System 352.3 Characterization ofThin Film 452.4 Summary 53Acknowledgments 53References 533 Nanostructures and Thin Films Deposited with Sputtering 59Weiqing Yang3.1 Introduction 593.2 Nanostructures with Sputtering 603.3 Thin Films Deposited with Sputtering 713.4 Summary 76Acknowledgments 77References 774 Nanostructures and Quantum Dots Development with Molecular Beam Epitaxy 81Wen Huang4.1 Introduction 814.2 Technology of MBE 824.3 Nanoheterostructures Fabricated by Molecular Beam Epitaxy 914.4 Quantum Dots Development with Molecular Beam Epitaxy 1014.5 Summary 103Acknowledgments 104References 1045 Carbon Nanomaterials and 2D Layered Materials Development with Chemical Vapor Deposition 105Taisong Pan5.1 Introduction 1055.2 Carbon Nanotube Synthesis by Chemical Vapor Deposition 1065.3 Graphene Synthesis by Chemical Vapor Deposition 1125.4 Metal Dichalcogenide Synthesis by Chemical Vapor Deposition 1155.5 Summary 119References 1206 Nanostructures Development with Atomic Layer Deposition 123Hulin Zhang6.1 Introduction 1236.2 Reaction Mechanisms 1256.3 Nanostructures Based on ALD 1316.4 Summary 136Acknowledgments 137References 1387 Nanomaterial Development with Liquid-Phase Epitaxy 141Weiqing Yang7.1 Introduction 1417.2 Hydrothermal Method 1427.3 Nanostructures Fabricated Using LPE 1477.4 Summary 156Acknowledgments 156References 1568 Nanostructural Thin Film Development with Chemical Solution Deposition 159Yanda Ji and Yuan Lin8.1 Introduction 1598.2 Precursor Solution Preparation 1598.3 Coating 1628.4 Thermal Treatment 1638.5 Control of the Microstructures in Thin Films Prepared by CSD Techniques 1648.6 Examples of NanostructuralThin Films Prepared by CSD Techniques 1678.7 Summary 174References 1759 Nanomaterial Development Using In Situ Liquid Cell Transmission Electron Microscopy 179Xin Chen,Wangfan Zhou, Debiao Xie, and Hongliang Cao9.1 Introduction 1799.2 The Technological Development of In Situ Liquid Cell TEM 1799.3 Nanomaterial Development Using In Situ Liquid Cell TEM Technology 1859.4 Summary and Outlook 191Acknowledgments 191References 19210 Direct-Writing Nanolithography 195Min Gao10.1 Introduction 19510.2 Electron Beam Lithography 19510.3 Focused Ion Beam Lithography 19810.4 Gas-Assisted Electron and Ion Beam Lithography 20010.5 SPM Lithography 20110.6 Dip-Pen Lithography 20510.7 Summary 206Acknowledgments 207References 20711 3D Printing of Nanostructures 209Min Gao11.1 Introduction 20911.2 3D Printing Processes 20911.3 Types of 3D Printing 21011.4 3D Direct LaserWriting by Multiphoton Polymerization 21411.5 3D Printing Applications 21711.6 Summary 219Acknowledgments 220References 22012 Nanostructured Thin Film Solid Oxide Fuel Cells 223Alex Ignatiev, Rabi Ebrahim, Mukhtar Yeleuov, Daniel Fisher, Xin Chen, NaijuanWu, and Serekbol Tokmoldin12.1 Introduction 22312.2 Solid Oxide Fuel Cells 22312.3 Summary 237Acknowledgments 237References 23713 Nanostructured Magnetic Thin Films and Coatings 239Goran Rasic13.1 Introduction 23913.2 High-Frequency Devices 24013.3 Magnetic Information Storage Devices 25113.4 Summary 261Acknowledgments 261References 26214 Phase Change Materials for Memory Application 267Liangcai Wu and Zhitang Song14.1 Introduction 26714.2 Ge2Sb2Te5 and Its Properties’ Improvement 26814.3 High-Speed and Lower-Power TiSbTe Materials 27714.4 Summary 283Acknowledgments 283References 28315 Nanomaterials and Devices on Flexible Substrates 285Hulin Zhang15.1 Introduction 28515.2 Nanomaterials on Flexible Substrates 28615.3 Devices on Flexible Substrates 29215.4 Summary 300Acknowledgments 301References 301Index 305