Del 7 - Series on Semiconductor Science and Technology
Plasma Etching
Fundamentals and Applications
Inbunden, Engelska, 1998
Av M. Sugawara, Japan) Sugawara, M. (Professor, Professor, Hachinohe Institute of Technology, Minoru Sugawara
4 029 kr
Beställningsvara. Skickas inom 5-8 vardagar
Fri frakt för medlemmar vid köp för minst 249 kr.The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Produktinformation
- Utgivningsdatum1998-05-28
- Mått163 x 242 x 23 mm
- Vikt743 g
- SpråkEngelska
- SerieSeries on Semiconductor Science and Technology
- Antal sidor356
- FörlagOUP OXFORD
- EAN9780198562870