Interconnects in VLSI Design

This book presents an updated selection of the most representative contributions to the 2nd and 3rd IEEE Workshops on Signal Propagation on Interconnects (SPI) which were held in Travemunde (Baltic Sea), Germany, May 13-15, 1998, and in Titisee-Neustadt (Black Forest), Germany, May 19-21, 1999. Interconnects in VLSI Design addresses the need of developers and researchers in the field of VLSI chip and package design. It offers a survey of current problems regarding the influence of interconnect effects on the electrical performance of electronic circuits and suggests innovative solutions. In this sense Interconnects in VLSI Design represents a continuation and a supplement to the first book, Signal Propagation on Interconnects, Kluwer Academic Publishers, 1998. The papers in Interconnects in VLSI Design cover a wide area of research directions. Apart from describing general trends they deal with the solution of signal integrity problems, the modeling of interconnects, parameter extraction using calculations and measurements and last, but not least, actual problems in the field of optical interconnects.